Date(s) - 15/10/2019
6:00 pm - 9:00 pm
Categories No Categories
“Improve nanoparticle characterization in environmental and industrial applications by leveraging ICP-MS.”
Charlie Chan, PhD
Research Specialist at 3M
The enhanced or novel properties of nanoparticles are expected to lead to their increasingly widespread use in consumer products such as in polymeric materials, and for commercial applications in textiles, biomedical applications, and environmental applications. Quantitative characterization of nanoparticles, both their sizes and concentrations, has been a challenge in numerous studies.[1,2] Some innovative inductively coupled plasma mass spectrometry (ICP-MS) methods, such as single particle/cell analysis and hyphenated techniques like differential mobility analyzer or field-flow fractionation – ICP-MS, have been introduced into the field of nanoparticle analysis. This talk will demonstrate how ICP-MS can be leveraged to solve toughest challenges in the field, for example sub-part-per-quadrillion limit of quantification or nanoparticle quantification in complicated matrices like wastewater, through a few example applications in environmental and industrial research at 3M.
Location: Urban Growler, St. Paul, MN
Time: 6:00 – 9:00pm
8-9 Questions and Social
Food will be served.
 E.J. Petersen, A.R. Montoro Bustos, B. Toman, M.E. Johnson, M. Ellefson, G.C. Caceres, A.L. Neuer, Q. Chan, J.W. Kemling, B. Mader, K. Murphy, M. Roesslein. Determining what really counts: modeling and measuring nanoparticle number concentrations, Environ. Sci. Nano. (2019). doi:10.1039/C9EN00462A.
 A.R. Montoro Bustos, E.J. Petersen, A. Possolo, M.R. Winchester, Post hoc Interlaboratory Comparison of Single Particle ICP-MS Size Measurements of NIST Gold Nanoparticle Reference Materials, Anal. Chem. 87 (2015) 8809–8817. doi:10.1021/acs.analchem.5b01741.
 Q. Chan, W. Wang, L. Zazzera, A. Simpson, J. Stomberg, M. Entezarian, D. Lei, M. Ellefson, B. Mader, J. Zhou, Single Particle Inductively Coupled Plasma Mass Spectrometry Metrology for Advanced Semiconductor Process Development, in: 2019 China Semicond. Technol. Int. Conf., IEEE, 2019: pp. 1–4. doi:10.1109/CSTIC.2019.8755801.
Bookings are closed for this event.